کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8024357 1517546 2018 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Electrodeposition with intermittent addition of trimethylamine borane to produce ductile bulk nanocrystalline Ni-B alloys
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Electrodeposition with intermittent addition of trimethylamine borane to produce ductile bulk nanocrystalline Ni-B alloys
چکیده انگلیسی
We developed a technique to dope electrodeposited Ni with B to produce ductile bulk electrodeposits of Ni-B alloys. The conventional method, in which TMAB is added as a source for B-doping to the deposition bath before electrodeposition, affected only the first layer, producing two layers of Ni-B alloys and pure Ni in the bulk electrodeposits. These inhomogeneous specimens showed poor tensile properties, because of processing-defects presented in the layer of Ni-B alloys. These defects were produced because TMAB immediately decomposes during electrodeposition, generating hydrogen gas. In contrast, the developed technique for B-doping, in which TMAB is added intermittently during electrodeposition, produced a more-uniform B content of 0.04 at.% in the growth direction. This B distribution resulted in a uniform nanocrystalline structure with a grain size of ~28 nm. The sample of bulk nanocrystalline Ni-B alloys exhibited a good tensile elongation of 7.6% with a high tensile strength of 1.45 GPa. The developed B-doping technique avoids the harmful effects of the hydrolysis of boron compounds, and it can produce electrodeposited bulk nanocrystalline Ni-B alloys with good ductility.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 337, 15 March 2018, Pages 411-417
نویسندگان
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