Ion assisted deposition of α-Al2O3 coatings by anodic evaporation in the arc discharge

Alumina coatings are deposited in an arc discharge by the method of reactive thermal anodic evaporation of aluminum with intensive ion assistance. The influence of the bias voltage and the ion current density on the structure and properties of the α-Al2O3 coatings, deposited on a stainless steel substrate with an isostructural Cr2O3 sublayer at 600 °C, was studied.