کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8027460 1517621 2014 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Superhard NbB2 −x thin films deposited by dc magnetron sputtering
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Superhard NbB2 −x thin films deposited by dc magnetron sputtering
چکیده انگلیسی
We have deposited weakly textured substoichiometric NbB2 −x thin films by magnetron sputtering from an NbB2 target. The films exhibit superhardness (42 ± 4 GPa), previously only observed in overstoichiometric TiB2 thin films, and explained by a self-organized nanostructuring, where thin TiB2 columnar grains hinder nucleation and slip of dislocations and a B-rich tissue phase between the grains prevent grain-boundary sliding. The wide homogeneity range for the NbB2 phase allows a similar ultra-thin B-rich tissue phase to form between thin (5-10 nm) columnar NbB2 −x grains also for films with a B/Nb atomic ratio of 1.8, as revealed here by analytical aberration-corrected scanning transmission electron microscopy. Furthermore, a coefficient of friction of 0.16 is measured for an NbB2 −x film sliding against stainless steel with a wear rate of 5 × 10− 7 mm3/Nm. X-ray photoelectron spectroscopy results suggest that the low friction is due to the formation of a lubricating boric acid film.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 257, 25 October 2014, Pages 295-300
نویسندگان
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