کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8027477 1517621 2014 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Microstructure and hardness of reactively r.f. magnetron sputtered Cr-V-O thin films in dependence on composition and substrate bias
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Microstructure and hardness of reactively r.f. magnetron sputtered Cr-V-O thin films in dependence on composition and substrate bias
چکیده انگلیسی
Cr-rich thin films were nanocrystalline and exhibited a single-phase solid solution corundum structure, (Cr,V)2O3, with only small deviation from the perfect corundum stoichiometry. This corundum structure was revealed for films with low vanadium content (up to a maximum vanadium concentration of 11 at.%) and confirmed by transmission electron microscopy analyses. All films of higher vanadium content were X-ray amorphous. In case of the Cr-V-O thin films with corundum structure, two effects on hardness were observed: First, the hardness of the films increased moderately with increasing vanadium concentration (in case of films deposited at zero volt substrate bias). Second, by applying a moderate substrate bias of − 100 V during deposition, the hardness values increased up to 38 GPa. These results indicate that proper chemical modification of Cr2O3 thin films, shown here for a modification with vanadium, can be a tool to design new protective coatings.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 257, 25 October 2014, Pages 355-362
نویسندگان
, , , , ,