کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8027549 | 1517624 | 2014 | 33 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Quantitative investigation of the role of high-energy particles in Al2O3 thin film growth: A molecular-dynamics study
ترجمه فارسی عنوان
بررسی کمی نقش ذرات با انرژی بالا در رشد فیلم نازک آلومینیوم: یک مطالعه مولکولی-دینامیکی
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
The presence of a small fraction of high-energy particles in the total particle flux is an important factor which affects the structure of atom-by-atom deposited thin films. In this paper the role of high-energy (up to 400Â eV) particles is studied by molecular dynamics simulations, focused on obtaining quantitative information not accessible experimentally. Aluminum oxide is used as a test case. In the case of film-forming particles with high sticking coefficient, the results show that one to few percent of high-energy atoms is sufficient for amorphization of otherwise crystalline materials. Consequently, all film-forming atoms have to be considered separately and have the optimum energy (optimum averaged energy per atom is insufficient). In the case of energetic bombardment by other (non film-forming) particles such as Ar, the results show that the film amorphization can take place but it requires higher energies and/or much higher number of particle impacts compared to the former case. The results are important for predictions based on experimentally measured energy distribution functions, and for defining pathways for the preparation of individual crystalline phases in general.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 254, 15 September 2014, Pages 131-137
Journal: Surface and Coatings Technology - Volume 254, 15 September 2014, Pages 131-137
نویسندگان
Jiri Houska,