کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8027637 | 1517624 | 2014 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Optical absorption spectroscopy of facing targets and conventional magnetron sputtering during process of Al-doped ZnO films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Facing targets sputtering (FTS) is a promising process for low-temperature TCO film deposition and for the significant reduction of damage in film structure by suppression of the direct impinging of high-energy particles due to confining plasma between two facing magnetic fields compared with conventional magnetron sputtering (CMS). In this study, FTS was compared with CMS by measuring Zn densities during the deposition process of Al-doped ZnO films with DC and 13.56Â MHz RF discharge at various process conditions. Optical absorption spectroscopy (OAS) was adopted for measuring Zn densities, for which a hollow cathode lamp was used as a source light of a 213.9Â nm line, which was selected to measure absorption coefficients and to calculate the ground state densities of Zn atoms. When RF power was applied, Zn densities were lower than in DC conditions in both CMS and FTS. Interestingly, in FTS, Zn densities were observed to be lower than in CMS regardless of the RF and DC powers, indicating an increase of plasma density associated with the high ionization rate and collision rate of FTS.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 254, 15 September 2014, Pages 371-375
Journal: Surface and Coatings Technology - Volume 254, 15 September 2014, Pages 371-375
نویسندگان
Yoon S. Choi, Jay B. Kim, Jeon G. Han,