کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8028802 | 1517641 | 2013 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Development of electroplated Ni-xZn films for under bump metallization application
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The feasibility of using electroplated Ni-xZn films was evaluated for a new application as the under bump metallization. Considering the alloy films in electroplating process, determining the deposition potential (affecting nucleation) and current density (affecting growth) is crucial. A suitable Ni-5Zn film exhibiting smooth and dense surface was derived at a low current density of 0.067Â ASD. After a 30Â s liquid reaction, intermetallic phase formation and Cu6Sn5 growth at the interface were visualized and analyzed using a field-emission electron probe microanalyzer. This study demonstrated that binary Ni-Zn films fabricated by electroplating might be a potential candidate for under bump metallization application.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 237, 25 December 2013, Pages 445-449
Journal: Surface and Coatings Technology - Volume 237, 25 December 2013, Pages 445-449
نویسندگان
Hsiu-Min Lin, Jenq-Gong Duh,