The deposition of crystallized TiO2 coatings by closed field unbalanced magnetron sputter ion plating

Reactive closed field unbalanced magnetron sputter ion plating (CFUBMSIP) provides an effective, industrially-compatible processing route for the deposition of metallic oxides, with controlled composition, structure, mechanical, electronic and optical properties. The production of crystallized as-deposited TiO2 thin coatings by reactive CFUBMSIP process is described. The arrangement of the deposition system; deposition parameters, including: working gases, deposition pressure, the sputtering power; and the influence of interlayer on the nucleation and the crystalline structure of TiO2 coatings are investigated.