Control of zinc oxide surface structure using combined atmospheric pressure-based CVD growth and plasma etching

By controlling the treatment environment, we were able to establish a relationship between the feed gas mixture and the etchant rate. Careful selection and control of processing parameters demonstrated the ability to modify the morphology with a high degree of uniformity and enhance the optical scatter properties. Atmospheric pressure-based processes are attractive for scalable production development, and future work will explore the potential of this process for large scale application.