In situ stress measurements and mechanical properties of a composition range of NiTi thin films deposited at elevated temperature

► Depending on composition different stress development was observed during film growth. ► Even at 450 °C films are apparently deposited amorphous. ► The observed compressive stress during the later stage of the deposition of Ni-rich films is caused by depositing on already crystallized films. ► Coefficient of thermal expansion (CTE) for the composition range was determined.