Microstructures and thermochromic characteristics of low-cost vanadium-tungsten co-sputtered thin films

► Films were prepared by single metallic target mixed with W (1.4%) and V (98.6%). ► Films were deposited without substrate temperature and annealed in air atmosphere. ► W-V co-sputtered approach improved the surface morphologies of VO2 thin films. ► W-V co-sputtered approach reduced the phase transition temperature from 68 °C to 40 °C. ► W-V co-sputtered approach narrowed the thermal hysteresis loop from 6 °C to 3 °C.