کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8037701 | 1518290 | 2018 | 24 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Structure and chemistry of interfaces between ceria and yttria-stabilized zirconia studied by analytical STEM
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Epitaxial undoped and Gd2O3-doped ceria films were grown by pulsed laser deposition on (1Â 1Â 1) faced Y2O3-stabilized zirconia (YSZ). Highly localized cerium reduction at the film-substrate interfaces is revealed by atomically resolved valence EELS mapping using Cs aberration-corrected scanning transmission electron microscopy. The chemical profiles reveal interdiffusion of Ce, (Gd), Y, Zr, forming an intermixing zone at the interface 7-9 (1Â 1Â 1) lattice planes wide. In its vicinity, the fraction of Ce3+ raises gradually over 6-8 lattice planes from zero in the bulk ceria to â100% in one single plane at the interface. Beyond this plane the Ce3+ fraction drops sharply within the YSZ substrate. In the vicinity of the interface systematic scan deflections are observed during EELS line scans. The advancing electron probe experiences a retarding force at the ceria side, and an accelerating force at the YSZ side, irrespective of the scan direction. This behavior is suggestive of coulombic interactions between the electron probe and a charged interface. This is interpreted as an indication of the presence of a space-charge situation at the YSZ/ceria interface, resulting from an excess negative charge at the ceria side (due to Ce3+cations) and an excess positive charge at the YSZ side (due to oxygen vacancies).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Ultramicroscopy - Volume 188, May 2018, Pages 90-100
Journal: Ultramicroscopy - Volume 188, May 2018, Pages 90-100
نویسندگان
H. Schmid, E. Gilardi, G. Gregori, P. Longo, J. Maier, P.A. van Aken,