کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8038062 | 1518320 | 2015 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
High contrast 3D imaging of surfaces near the wavelength limit using tabletop EUV ptychography
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: High contrast 3D imaging of surfaces near the wavelength limit using tabletop EUV ptychography High contrast 3D imaging of surfaces near the wavelength limit using tabletop EUV ptychography](/preview/png/8038062.png)
چکیده انگلیسی
Scanning electron microscopy and atomic force microscopy are well-established techniques for imaging surfaces with nanometer resolution. Here we demonstrate a complementary and powerful approach based on tabletop extreme-ultraviolet ptychography that enables quantitative full field imaging with higher contrast than other techniques, and with compositional and topographical information. Using a high numerical aperture reflection-mode microscope illuminated by a tabletop 30 nm high harmonic source, we retrieve high quality, high contrast, full field images with 40 nm by 80 nm lateral resolution (â1.3λ), with a total exposure time of less than 1 min. Finally, quantitative phase information enables surface profilometry with ultra-high, 6 Ã
axial resolution. In the future, this work will enable dynamic imaging of functioning nanosystems with unprecedented combined spatial (<10Â nm) and temporal (<10Â fs) resolution, in thick opaque samples, with elemental, chemical and magnetic sensitivity.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Ultramicroscopy - Volume 158, November 2015, Pages 98-104
Journal: Ultramicroscopy - Volume 158, November 2015, Pages 98-104
نویسندگان
Bosheng Zhang, Dennis F. Gardner, Matthew D. Seaberg, Elisabeth R. Shanblatt, Henry C. Kapteyn, Margaret M. Murnane, Daniel E. Adams,