کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8044270 | 1518917 | 2018 | 27 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
High transparent and conductive undoped ZnO thin films deposited by reactive ion-beam sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: High transparent and conductive undoped ZnO thin films deposited by reactive ion-beam sputtering High transparent and conductive undoped ZnO thin films deposited by reactive ion-beam sputtering](/preview/png/8044270.png)
چکیده انگلیسی
For the first time, reactive ion-beam sputtering method was successfully used for the deposition of conductive undoped ZnO thin films on glass and Si substrates. The best films quality was observed in the samples deposited at Tsub of 200-250â¯Â°C and Va of 6â¯keV. The ZnO films demonstrated a p-type conductivity, which however was not stable over time, and resistivity ranging from 2.2â¯Ãâ¯10â3 to 2â¯Ãâ¯10â1 Ohmâcm, being 86% transmitted for a visible light.269
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 153, July 2018, Pages 204-210
Journal: Vacuum - Volume 153, July 2018, Pages 204-210
نویسندگان
Sergii Golovynskyi, Arsenii Ievtushenko, Sergii Mamykin, Mykhailo Dusheiko, Iuliia Golovynska, Oleksandr Bykov, Olena Olifan, Denys Myroniuk, Sergii Tkach, Junle Qu,