کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8044935 1518948 2015 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Production of a uniform VHF H2 plasma by a narrow-gap discharge
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Production of a uniform VHF H2 plasma by a narrow-gap discharge
چکیده انگلیسی
We produced a VHF H2 plasma (frequency, 60 MHz) by a narrow-gap discharge and examined the plasma parameters as a function of pressure and power, where two parallel plate electrodes (400 × 300 mm2) were used. The plasma density reached a peak at a certain pressure, and when the power was increased, the peak pressure at which the density reached this peak shifted to higher pressures. Measured sheath potentials were lower than the theoretical values while the electron temperature was relatively high. An estimation of plasma uniformity was attempted by measuring the ion saturation current distribution, and the uniformity of about 4% was achieved.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 121, November 2015, Pages 289-293
نویسندگان
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