Engineering of AlON interlayer in Al2O3/AlON/In0.53Ga0.47As gate stacks by thermal atomic layer deposition

Engineering of AlON interlayer in Al2O3/AlON/In0.53Ga0.47As gate stacks by thermal atomic layer deposition

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Current Applied Physics - Volume 18, Issue 8, August 2018, Pages 919-923

Woo Chul Lee, Cheol Jin Cho, Suk-In Park, Dong-Hwan Jun, Jin Dong Song, Cheol Seong Hwang, Seong Keun Kim,