A parameterization of the chemistry-normality dependence of bulk etch rate in a CR-39 detector

An empirical relationship describing the bulk etch rate is formulated. The equation involves two free fitting parameters, which reproduce the bulk etch rate for CR-39 by alpha particles at different normalities of the etching solution. The values of the fitting parameters were obtained from the experimental data. This relationship is used to predict the bulk etch rate at different normalities.