کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
846796 909212 2016 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Investigation of structural and optical properties of copper doped NiO thin films deposited by RF magnetron reactive sputtering
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی (عمومی)
پیش نمایش صفحه اول مقاله
Investigation of structural and optical properties of copper doped NiO thin films deposited by RF magnetron reactive sputtering
چکیده انگلیسی

Different percentages of copper doped NiO thin films were deposited on corning glass by RF magnetron sputtering process in fixed vacuum condition, 0–18% in five steps. The plasma were mixture of Ar + O2 with fixed ratio of 10% during the coating process. Characterization of these films were performed using X-ray diffraction, atomic force microscopy, UV–vis spectroscopy. EDS and ellipsometry have also been done to investigate elemental composition and film thickness. It is found that with increasing Cu dopant percentage, the crystalline quality decrease tending to amorphous structure. The X-ray diffraction pattern also shows that the films have cubic phase with preferred orientation (200). Measured optical transmittance declined with increasing copper dopant and the band gap (Eg) decrease −up to 12%- monotonically.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optik - International Journal for Light and Electron Optics - Volume 127, Issue 19, October 2016, Pages 8124–8129
نویسندگان
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