Investigation of annealing effects on optical properties of Ti thin films deposited by RF magnetron sputtering

Titanium oxide thin films were synthesized through thermal oxidation of sputter deposited titanium layers on glass substrates. Transmittance spectra of UV–vis analysis were utilized to calculate thickness, refractive index and extinction coefficient of the oxidized layers by using Swanepoel   method. Optical parameters like; optical band gap energy Egopt, conductivity σopt, dielectric constants ɛr, ɛi and dissipation factor tan (δ); were also determined. AFM imaging of the as sputtered thin films showed that with increasing deposition time, surface roughness increases. Optical measurements indicate that transmittance decreases with increasing sputtering time in visible and infrared spectral range.