کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
847203 | 909221 | 2016 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Investigation of annealing effects on optical properties of Ti thin films deposited by RF magnetron sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Investigation of annealing effects on optical properties of Ti thin films deposited by RF magnetron sputtering Investigation of annealing effects on optical properties of Ti thin films deposited by RF magnetron sputtering](/preview/png/847203.png)
چکیده انگلیسی
Titanium oxide thin films were synthesized through thermal oxidation of sputter deposited titanium layers on glass substrates. Transmittance spectra of UV–vis analysis were utilized to calculate thickness, refractive index and extinction coefficient of the oxidized layers by using Swanepoel method. Optical parameters like; optical band gap energy Egopt, conductivity σopt, dielectric constants ɛr, ɛi and dissipation factor tan (δ); were also determined. AFM imaging of the as sputtered thin films showed that with increasing deposition time, surface roughness increases. Optical measurements indicate that transmittance decreases with increasing sputtering time in visible and infrared spectral range.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optik - International Journal for Light and Electron Optics - Volume 127, Issue 13, July 2016, Pages 5383–5389
Journal: Optik - International Journal for Light and Electron Optics - Volume 127, Issue 13, July 2016, Pages 5383–5389
نویسندگان
I. Manouchehri, K. Gholami, B. Astinchap, R. Mordian, D. Mehrparvar,