Effects of NEA GaN photocathode performance parameters on quantum efficiency

Using research on the negative electron affinity GaN photocathode photoemission mechanism, we obtained the reflective-type and transmission-type GaN photocathode quantum efficiency formulas. The influence on quantum efficiency and sensitivity of integral of cathode performance parameters such as electron surface escape probability P, electron diffusion length LD, absorption coefficient α, back-interface recombination rate Sv and cathode thickness Te, were analyzed using these formulas. It was found that to obtain negative electron affinity GaN optoelectronic cathodes with high quantum efficiencies, we must constantly improve cathode activation technologies and the surface escaping probability of cathode. Also, we must increase the electronic diffusion length, reduce the rate of compounding, and find the optimal thickness of the cathode transmit layer based for the specific electronic diffusion length.