Study the optical properties of titanium oxide thin films deposited on glass substrate at different deposition angles by resistive evaporation method

Titanium oxide thin films of 33 nm thickness were deposited on glass substrates by resistive evaporation method under UHV conditions, and at different deposition angles of 0°, 20° and 30° at room temperature. Their optical spectra were measured by spectrophotometer in the spectral range of 300–1100 nm wavelength (UV–vis). The optical constants such as, real part of refractive index (n), imaginary part of refractive index (k), real and imaginary parts of dielectric function ɛ1 and ɛ2 respectively, absorption coefficient (α), real part of conductivity (δ1) and imaginary part of conductivity (−δ2) were obtained using the Kramers–Kronig analysis.Band-gap energy (Eg) was also estimated for these films. Fraction of voids was determined using the Aspens theory.