کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9566723 | 1388367 | 2005 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Structural and spectroscopic analysis of hot filament decomposed ethylene deposited at low temperature on silicon surface
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Structural and spectroscopic analysis of hot filament decomposed ethylene deposited at low temperature on silicon surface Structural and spectroscopic analysis of hot filament decomposed ethylene deposited at low temperature on silicon surface](/preview/png/9566723.png)
چکیده انگلیسی
The deposition of decomposed ethylene on silicon wafer at lower temperature using hot filament chemical vapor deposition (HFCVD) method was applied to compose thin film of carbon and its compounds with silicon and hydrocarbon structures. The films were analyzed using Raman spectroscopy, X-ray diffraction, and scanning electron microscopy with elemental microanalysis by energy dispersive X-ray spectrometer. The structure and morphology of the early stage of the film deposition was analyzed. The obtaining of SiC as well as diamond-like structure with this method and catalytic influence of chemical admixtures on the film structure and properties are discussed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 252, Issue 4, 15 November 2005, Pages 1167-1174
Journal: Applied Surface Science - Volume 252, Issue 4, 15 November 2005, Pages 1167-1174
نویسندگان
F.-K. Tung, E. Perevedentseva, P.-W. Chou, C.-L. Cheng,