کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9567275 1503713 2005 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Formation of microcrystalline germanium (μc-Ge:H) films from inductively coupled plasma CVD
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Formation of microcrystalline germanium (μc-Ge:H) films from inductively coupled plasma CVD
چکیده انگلیسی
Inductively coupled RF plasma of H2-diluted GeH4 gas was applied to the growth of hydrogenated microcrystalline germanium (μc-Ge:H) films on quartz in a reactor with an external single-turn antenna placed on quartz plate window parallel to the substrate. The deposition rate, the crystallinity and the thickness of an amorphous incubation layer formed in the early stages of the film growth were evaluated as functions of GeH4 concentration, gas flow rate, substrate temperature and the distance between the antenna and the grounded substrate susceptor. We demonstrated the growth of highly crystalized Ge films at a rate as high as 0.9 nm/s at 250 °C using a 8.3% GeH4 diluted with H2.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 244, Issues 1–4, 15 May 2005, Pages 12-15
نویسندگان
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