کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9567277 | 1503713 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Influence of thickness of Hf buffer layer on the interfacial structures of sputtered HfO2 on SiO2/Si
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Influence of thickness of Hf buffer layer on the interfacial structures of sputtered HfO2 on SiO2/Si Influence of thickness of Hf buffer layer on the interfacial structures of sputtered HfO2 on SiO2/Si](/preview/png/9567277.png)
چکیده انگلیسی
The influence of thickness of Hf-metal buffer layer on the interfacial diffusion and reaction was investigated using in situ X-ray photoelectron spectroscopy, scanning Auger microscope and grazing incident X-ray reflectivity. Hf-metal firstly reacted with native Si oxide forming Hf silicates, and all Si-O was further reduced to be Si0 after 1Â nm Hf-metal deposition. The Hf-metal and Hf-suboxide in Hf(1Â nm)/SiO2/Si structure were further oxidized to be Hf4+ during HfO2 sputtering deposition and post-deposition annealing. Si diffused out and reacted with HfO2 during annealing. The Hf(1Â nm) buffer layer exhibited a better performance than the Hf(0.3Â nm) buffer layer in suppressing the diffusion of Si and the reaction between diffused Si and HfO2.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 244, Issues 1â4, 15 May 2005, Pages 21-25
Journal: Applied Surface Science - Volume 244, Issues 1â4, 15 May 2005, Pages 21-25
نویسندگان
Ruiqin Tan, Yasushi Azuma, Isao Kojima,