کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9567290 1503713 2005 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Optical effects in silica glass during implantation of 60 keV Cu− ions
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Optical effects in silica glass during implantation of 60 keV Cu− ions
چکیده انگلیسی
Spectra of the optical transmission and ion-induced photon emission (IIPE) of silica glass were measured during implantation of 60 keV Cu− ions at ion fluxes from 1 to 75 μA/cm2 up to a fluence of 2 × 1017 ions/cm2, aimed at monitoring the formation of Cu nanoparticles. The precipitation threshold of Cu atoms is flux-dependent. At fluxes from 1 to 10 μA/cm2, the formation of nanoparticles is efficient up to fluences of 2 × 1017 ions/cm2. The efficiency of IIPE of Cu+ solutes in silica glass (band at 2.25 eV) is proportional to a total concentration of Cu solutes. In a single-phase region (solid solution of Cu atoms), the efficiency of IIPE of Cu+ solutes is flux-independent. In a two-phase region (solid solution and Cu nanoparticles), the dynamic balance between the nanoparticles and Cu solutes determines the flux-dependent behavior of the efficiency of IIPE.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 244, Issues 1–4, 15 May 2005, Pages 79-83
نویسندگان
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