کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9567325 | 1503713 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Determination of interface roughness of Gd films deposited on Si surface using improved wavelet transform of X-ray reflectivity data
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Determination of interface roughness of Gd films deposited on Si surface using improved wavelet transform of X-ray reflectivity data Determination of interface roughness of Gd films deposited on Si surface using improved wavelet transform of X-ray reflectivity data](/preview/png/9567325.png)
چکیده انگلیسی
An improved wavelet transform method for the analysis of specular X-ray reflectivity data has been developed. It permits the evaluation of the thickness and roughness of particular layers in the thin film without assuming a certain film structure. The advantage of this method is that it can be applied to the analysis of a multilayer with unknown chemical and physical properties. It is useful in the characterization of structures with a complex composition, particularly oxide or diffuse layers. The present approach was successfully applied to the study of experimental data obtained on Gd thin nanoparticle films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 244, Issues 1â4, 15 May 2005, Pages 235-239
Journal: Applied Surface Science - Volume 244, Issues 1â4, 15 May 2005, Pages 235-239
نویسندگان
Oleksiy Starykov, Kenji Sakurai,