کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9567348 | 1503713 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Chemical properties of an oxide nanoskin on a polymeric surface
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
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چکیده انگلیسی
Vapor phase chemisorption of 1,3,5,7-tetramethylcyclotetrasiloxane onto polyimide (PI) substrates and subsequent photooxidation using 172Â nm vacuum ultraviolet (VUV) light successfully produced a silicon dioxide (SiO2) layer of molecular-scale thickness, that is, an “oxide nanoskin” (ONS). This ONS was estimated to be around 1Â nm thick by high-resolution transmission electron microscopy. Due to the ONS coating, the surface acidity of the PI substrate increased markedly and its isoelectric point shifted from around pH 3.5 to 2.0, which was almost equal to that of a native oxide-covered Si (SiO2/Si) substrate. PI surfaces both with and without the ONS were further modified using a vapor of fluoroalkylsilane (FAS). Based on contact angle analysis, the surface energy of the FAS/ONS/PI substrate was mostly consistent with that of a SiO2/Si substrate covered with a self-assembled monolayer (SAM) composed of FAS molecules. Our ONS was found to be effective in fabricating a FAS-SAM on a polymer substrate.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 244, Issues 1â4, 15 May 2005, Pages 334-337
Journal: Applied Surface Science - Volume 244, Issues 1â4, 15 May 2005, Pages 334-337
نویسندگان
Atsushi Hozumi, Naoto Shirahata,