کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9567659 | 1503719 | 2005 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
A study on the reaction between chlorine trifluoride gas and glass-like carbon
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
The reaction between glass-like carbon (GC) and chlorine trifluoride (ClF3) gas was investigated with weight measurements, surface analysis, and gas desorption measurements, where the ClF3 gas is used for the in situ cleaning of tubes in silicon-related fabrication equipment. From Auger electron spectroscopy and X-ray photoelectron spectroscopy measurements, a carbon mono-fluoride, -(CF)n-, film near the surface of GC is considered to be grown onto the GC surface above 400 °C by the chemical reaction with ClF3, and this thickness of the fluoride film depends on the temperature. The grown fluoride film desorbs by annealing in a vacuum up to 600 °C. Although GC is apparently etched by ClF3 over 600 °C, the etch rate of GC is much lower than that of SiC and quartz.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 240, Issues 1â4, 15 February 2005, Pages 381-387
Journal: Applied Surface Science - Volume 240, Issues 1â4, 15 February 2005, Pages 381-387
نویسندگان
Yoji Saito, Takashi Nishizawa, Maki Hamaguchi,