کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9595214 | 1507970 | 2005 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Physico-chemical and X-ray optical characterizations of a Mo/Si multilayer interferential mirror upon annealing
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Physico-chemical and X-ray optical characterizations of a Mo/Si multilayer interferential mirror upon annealing Physico-chemical and X-ray optical characterizations of a Mo/Si multilayer interferential mirror upon annealing](/preview/png/9595214.png)
چکیده انگلیسی
We investigate on a Mo/Si multilayer interferential mirror (MIM) as a function of annealing at temperatures up to 600 °C. The physicochemical state of the silicon atoms within the MIM is characterized by X-ray emission spectroscopy (XES). A thin silicide layer is detected at the interfaces of the as-prepared system, whose thickness increases upon annealing. Measurements of the reflecting power at 1.33 nm show that both the reflectivity and the period markedly decrease as the annealing temperature increases, thus stressing on the interplay between the interface physico-chemical state and the optical properties. Our results shed light on the highest temperature regime, 600 °C, where the MIM loses its periodic structure as the majority of the silicon atoms are involved in the MoSi2 compound. The diffusion coefficient is estimated from the evolution of the reflected intensity and the period. An activation energy of the diffusion process of 0.52 eV is deduced.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface Science - Volume 589, Issues 1â3, 1 September 2005, Pages 164-172
Journal: Surface Science - Volume 589, Issues 1â3, 1 September 2005, Pages 164-172
نویسندگان
P. Jonnard, I. Jarrige, R. Benbalagh, H. Maury, J.-M. André, Z. Dankházi, G. Rolland,