کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9672214 | 1450564 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Reliability enhancement with the aid of transient infrared thermal analysis of smart Power MOSFETs during short circuit operation
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The usage of novel measurement techniques enhances the capabilities of researchers and power device manufacturers to understand and address reliability problems in novel Smart Power Devices. Along this line of argument, this work describes a method to improve the reliability of the smart Power MOSFET devices by design. The design optimization process involves Silicon layout, interconnections, packaging and protection strategy as well. Accurate thermal transient analyses, made possible by the unique features of a custom infrared radiometric microscope experimental setup which allows dynamic temperature detection with a bandwidth of 1 MHz over the chip area, indicated the way to minimize peak temperature and to verify the effect of the optimization.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 45, Issues 9â11, SeptemberâNovember 2005, Pages 1706-1710
Journal: Microelectronics Reliability - Volume 45, Issues 9â11, SeptemberâNovember 2005, Pages 1706-1710
نویسندگان
A. Irace, G. Breglio, P. Spirito, R. Letor, S. Russo,