کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9697433 | 1460824 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The effects of plasma post-treatment on the photoresponsivity of CVD diamond UV photodetectors
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: The effects of plasma post-treatment on the photoresponsivity of CVD diamond UV photodetectors The effects of plasma post-treatment on the photoresponsivity of CVD diamond UV photodetectors](/preview/png/9697433.png)
چکیده انگلیسی
In this paper, we report the influence of room temperature post-treatment using an oxygen and carbon tetrafluoride plasma on the photoresponsivity of chemical vapour deposited (CVD) polycrystalline diamond UV photodetectors. X-ray diffraction (XRD) measurements show that the plasma-treatment preferentially passivates the defects at the (220) and (311) facets of diamond film. Photoluminescence (PL) and Raman measurements carried out on these diamond surfaces indicate that the plasma can effectively etch the sp2-bonded carbon impurities and passivate the silicon-vacancy defects. Plasma post-treatment employed on devices resulted in more than two orders of magnitude increase in the photoresponsivity discrimination between the UV (â¼225 nm) and visible light (â¼700 nm) regions.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 14, Issues 3â7, MarchâJuly 2005, Pages 541-545
Journal: Diamond and Related Materials - Volume 14, Issues 3â7, MarchâJuly 2005, Pages 541-545
نویسندگان
S.G. Wang, P.J. Sellin, Q. Zhang, A. Lohstroh, M.E. Ozsan, J.Z. Tian,