کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9784083 | 1512029 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
NH3-RTP grown ultra-thin oxynitride layers for MOS gate applications
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
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چکیده انگلیسی
RTP grown oxynitride layers were applied to NMOS transistors as gate dielectrics and their device performances were compared with those prepared by RF plasma nitridation (RF-PN). Transistors with RTP-grown oxynitride gate show a significantly better uniformity in threshold voltage on 200Â mm wafers than those oxynitride layers grown by RF-PN. It was also found that the leakage currents of the RTP and RF-PN gate oxynitrides obey the same trend from the 1.5Â nm EOT regime down to the 1.0Â nm EOT regime. This observation indicates that the leakage current barrier quality of the RTP oxynitride is at least as good as the RF-PN oxynitrides.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: B - Volume 118, Issues 1â3, 25 April 2005, Pages 55-59
Journal: Materials Science and Engineering: B - Volume 118, Issues 1â3, 25 April 2005, Pages 55-59
نویسندگان
H.Y.A. Chung, W. Dietl, J. Niess, Z. Nényei, W. Lerch, K. Wieczorek, N. Krumm, A. Ludsteck, I. Eisele,