Rib waveguides fabricated by means of chemical etching of sol-gel SiO2:TiO2 films

The paper involves the fabrication of channel rib waveguides with the use of selective chemical etching of dielectric waveguide films. The two-component dielectric waveguide films SiO2:TiO2 were produced using the sol-gel method. A photoresist was applied as a mask in the etching process. The solution of ammonia fluoride NH4F was applied in the processes of chemical etching. The paper presents the determined technological characteristics and the obtained channel rib waveguides.