کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9796176 | 1514942 | 2005 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
High spatial resolution stress measurements using synchrotron based scanning X-ray microdiffraction with white or monochromatic beam
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: High spatial resolution stress measurements using synchrotron based scanning X-ray microdiffraction with white or monochromatic beam High spatial resolution stress measurements using synchrotron based scanning X-ray microdiffraction with white or monochromatic beam](/preview/png/9796176.png)
چکیده انگلیسی
Scanning X-ray microdiffraction (μSXRD) combines the use of high brilliance synchrotron sources with state-of-the-art achromatic X-ray focusing optics and large area detector technology. Using either white or monochromatic beams, it allows for orientation and strain/stress mapping of polycrystalline thin films with submicron spatial resolution. The present paper will focus on three applications performed at the Advanced Light Source: the study of local plasticity in aluminum thin films, the study of the spontaneous growth of tin whiskers in lead-free solder finish and the measurement of strain field around thin film bucklings.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: A - Volume 399, Issues 1â2, 15 June 2005, Pages 92-98
Journal: Materials Science and Engineering: A - Volume 399, Issues 1â2, 15 June 2005, Pages 92-98
نویسندگان
N. Tamura, H.A. Padmore, J.R. Patel,