کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9809495 | 1517710 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Reactive sputtering of iron in Ar-N2 and Ar-O2 mixtures
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
This paper reports on the preparation of iron nitride and iron oxide films by DC reactive magnetron sputtering. The reactivity of the Fe-N2 and Fe-O2 systems is compared by the measurement of the total pressure in the deposition chamber, the iron target voltage and the films' growth rate as a function of the reactive gas flow rate. The Fe-N2 system does not exhibit an instability phenomenon and the total pressure is quite proportional to the nitrogen flow rate. This system exhibits a low reactivity as confirmed by the effect of the nitrogen flow rate on the films' growth rate. On the other hand, a hysteresis loop occurs for the Fe-O2 system, indicating a higher reactivity for this last system.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 200, Issues 1â4, 1 October 2005, Pages 431-434
Journal: Surface and Coatings Technology - Volume 200, Issues 1â4, 1 October 2005, Pages 431-434
نویسندگان
C. Petitjean, C. Rousselot, J.F. Pierson, A. Billard,