کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9809550 | 1517712 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effects of thermal treatment on structural and electrical properties of sputtered Ir-W alloy thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Thermally and chemically stable electrode films are required for capacitor electrodes of semiconductor memories, such as dynamic random access memories (DRAMs) and ferroelectric random access memories (FeRAMs). In this study, iridium-tungsten (Ir-W) alloy thin films were prepared on SiO2/Si substrates by RF magnetron sputtering, and the effects of thermal treatment in oxygen atmosphere on the structural and electrical properties of the films were studied. The surface of the as-deposited Ir-W films was very smooth and the films showed low electrical resistivities below 120 μΩ cm. The resistances and the smooth surface morphology of the Ir-W (approximately 20 at.%) films remained after thermal treatment up to 600 °C in oxygen, which indicates the high thermal stability of the Ir-W alloy thin films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 198, Issues 1â3, 1 August 2005, Pages 148-151
Journal: Surface and Coatings Technology - Volume 198, Issues 1â3, 1 August 2005, Pages 148-151
نویسندگان
Yoshio Abe, Eiji Watanabe, Katsutaka Sasaki, Shigemi Iura,