کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9809596 1517712 2005 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effect of substrate angle on properties of ITO films deposited by cathodic arc ion plating with In-Sn alloy target
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Effect of substrate angle on properties of ITO films deposited by cathodic arc ion plating with In-Sn alloy target
چکیده انگلیسی
Indium tin oxide (ITO) thin films have been deposited by cathodic arc ion plating (CAIP) using In-Sn alloy target as the source material. By varying substrate angle for deposition without using any filtering technique, macroparticle free, high quality ITO films are obtained successfully. In an oxygen atmosphere of 0.5 Pa without substrate heating, the lowest resistivity and lowest absorption coefficient obtained are 2×10−4 Ω cm and 1.6×10−3 nm−1, respectively. Our results show that this is a simple way to reduce the macroparticles and obtain high-quality ITO films. Other properties such as film structure, surface morphology, carrier concentration and mobility have also been investigated.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 198, Issues 1–3, 1 August 2005, Pages 362-366
نویسندگان
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