کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9809691 | 1517714 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Ionization enhancement of zirconium atoms in inductively coupled discharge
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Ionization enhancement of zirconium atoms in inductively coupled discharge Ionization enhancement of zirconium atoms in inductively coupled discharge](/preview/png/9809691.png)
چکیده انگلیسی
This paper reports on ionization of sputtered zirconium (Zr) atoms in inductively coupled argon discharge. A Zr+ ion flux fraction to overall Zr species mainly was obtained by deposition measurements with the retarding bias method, and the fraction approximately reached â¼100%. The Zr+ ion fraction was affected by the discharge pressure, and hardly dependent on the discharge power corresponding to an electron density. This result suggested that the Zr+ ions were generated with ionization process other than electron impact such as Penning effect. There was an optimal pressure to produce the Zr+ ions, and the Zr+ ion density estimated from the deposition measurement was consistent with that obtained from a combination of Langmuir probe measurements and mass spectroscopic measurements.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 196, Issues 1â3, 22 June 2005, Pages 188-191
Journal: Surface and Coatings Technology - Volume 196, Issues 1â3, 22 June 2005, Pages 188-191
نویسندگان
Keiji Nakamura, Hiroaki Yoshinaga, Ken Yukimura,