کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9809691 1517714 2005 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Ionization enhancement of zirconium atoms in inductively coupled discharge
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Ionization enhancement of zirconium atoms in inductively coupled discharge
چکیده انگلیسی
This paper reports on ionization of sputtered zirconium (Zr) atoms in inductively coupled argon discharge. A Zr+ ion flux fraction to overall Zr species mainly was obtained by deposition measurements with the retarding bias method, and the fraction approximately reached ∼100%. The Zr+ ion fraction was affected by the discharge pressure, and hardly dependent on the discharge power corresponding to an electron density. This result suggested that the Zr+ ions were generated with ionization process other than electron impact such as Penning effect. There was an optimal pressure to produce the Zr+ ions, and the Zr+ ion density estimated from the deposition measurement was consistent with that obtained from a combination of Langmuir probe measurements and mass spectroscopic measurements.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 196, Issues 1–3, 22 June 2005, Pages 188-191
نویسندگان
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