کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9809741 | 1517715 | 2005 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Deep oxidation of aluminum by a DC oxygen plasma
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
A novel way of oxidising aluminum using a DC oxygen plasma is described. The oxidation is carried out with a pressure of â¼0.1 bar, an electrical current lower than 3 mA, and a working distance between the electrodes of the order of 1 cm. The pressure is seen to have a stronger influence on the results than the working distance. The process does not damage the surface and only minor differences are detected in the topography due to the expansion of the aluminum during oxidation. It is shown that the region affected by the plasma results in a â¼50-nm-thick amorphous aluminum oxide layer (OL). We find that the kinetics of oxide growth can be described as having two main sources, the main one originating from the plasma and the other from the surrounding ionized gas.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 195, Issues 2â3, 31 May 2005, Pages 168-175
Journal: Surface and Coatings Technology - Volume 195, Issues 2â3, 31 May 2005, Pages 168-175
نویسندگان
J.A. Baier-Saip, J.I. Avila, G. Tarrach, A.L. Cabrera, V. Fuenzalida, R.A. Zarate, I.K. Schuller,