کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9809763 | 1517715 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Study of mechanical properties and stress of tetrahedral amorphous carbon films prepared by pulse biasing
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Tetrahedral amorphous carbon (ta-C) films have been deposited by filtered cathodic vacuum arc technique with substrate pulse bias ranging from â100 to â3000 V. The surface morphology, structure, stress, hardness and Young's modulus of the films were characterized using atomic force microscopy, Raman spectroscopy, surface profilometry and nanoindentation. The results show that the highest stress existed at the pulse bias voltage between â100 and â200 V. The mechanical properties of the films were determined directly from an Oliver-Pharr analysis of nanoindention experimental data. The highest hardness and reduced Young's modulus, which were achieved at â200 V, were 85 and 390 GPa, respectively. By using the relationship between hardness and stress, 1-μm-thick ta-C films were successfully deposited using â2000 V with a moderate hardness of about 36 GPa and a low stress of less than 1 GPa.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 195, Issues 2â3, 31 May 2005, Pages 338-343
Journal: Surface and Coatings Technology - Volume 195, Issues 2â3, 31 May 2005, Pages 338-343
نویسندگان
Y.B. Zhang, S.P. Lau, D. Sheeja, B.K. Tay,