کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9809813 | 1517717 | 2005 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Study on the mode transitions for rf power dissipation in capacitively coupled plasma
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
We present rf power dissipation mode transitions in capacitively coupled plasma (CCP) at various experimental conditions. We investigated power dissipation mode transitions from ion-dominated to electron-dominated dissipation mode and vice versa. Suggesting a modified simple model for rf dissipation, we theoretically evaluated the mode transitions induced by changing rf current, gas pressure, driving frequency, magnetic field, and gas species. We also observed power dissipation mode transitions for various experimental conditions by measuring the electrical characteristics. The calculated result from the simple model agreed well with the experimental result. Through a consideration of the power dissipation mode transition under different experimental conditions, this study suggests various ways to control rf power dissipation between electrons and ions.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 193, Issues 1â3, 1 April 2005, Pages 81-87
Journal: Surface and Coatings Technology - Volume 193, Issues 1â3, 1 April 2005, Pages 81-87
نویسندگان
S.J. You, S.K. Ahn, H.Y. Chang,