کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9809836 | 1517717 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Properties of TiAlN coatings synthesized by closed-field unbalanced magnetron sputtering
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The deposition rate of TiAlN films produced by CFUBMS with four magnetron sources was increased up to approximately 1.35 times in comparison with that obtained in the single UBMS. The results of AES and XRD analyses revealed that TiAlN films deposited by two types of magnetron sputtering have similar chemical composition and crystal structure as a function of the N2 partial pressure. However, TEM analysis showed that TiAlN film synthesized by CFUBMS with four magnetron sources has a denser columnar structure and its column width and grain size were increased up to approximately two times compared with film by the single UBMS. In addition, the nanoindentation tests showed that the hardness and elastic modulus of films by CFUBMS have higher values than those of films by the single UBMS. This enhancement in the CFUBMS with four magnetron sources system on the mechanical properties could be attributed to the formation of dense and well-crystallized film by the high-level ion bombardment of growing film.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 193, Issues 1â3, 1 April 2005, Pages 213-218
Journal: Surface and Coatings Technology - Volume 193, Issues 1â3, 1 April 2005, Pages 213-218
نویسندگان
GwangSeok Kim, SangYul Lee, JunHee Hahn,