Electrodeposition of TiO2 and RuO2 thin films for morphology-dependent applications

TiO2 and RuO2 have many applications in the field of photocatalysis, environmental protection, high charge storage capacity devices etc. In the present investigation, nanocrystalline TiO2 and RuO2 thin films have been electrodeposited from aqueous baths. The morphological studies of these films have been carried out using scanning electron microscopy and transmission electron microscopy. The morphology of these films and their device performance are closely related. The TiO2 films showed a compact morphology, useful in covering CdSe semiconductor in photoelectrochemical cells. The porous morphology of RuO2 film is useful in improving supercapacitor performance.