Ion accelerator facilities at the University of Göttingen

The accelerators at the II. Physikalisches Institut of the University of Göttingen were reinstalled in a new building during the summer of 2003. They cover a wide energy range and are used for many different applications. The highest energies are obtained with the 3 MV Pelletron MaRPel, which is preferentially used for ion beam analysis. Ions in the energy range from 30 keV to 1000 keV are delivered by the 500 kV heavy ion implanter IONAS which is used for analysis, implantation and ion beam modification. ADONIS and STRINGER are mass-separated ion beam deposition (MSIBD) systems which produce 30 keV mass separated beams which can be decelerated to 20 eV to synthesize isotopically pure hard coatings like cubic BN, tetrahedral bounded amorphous C (ta-C) and BxC. The low energy implanter IOSCHKA delivers ions of 10 keV maximum, which can be slowed down to a few eV. The targets can be transferred in UHV to an STM set-up to investigate surface modifications after single ion impacts or the development of surface ripple patterns.