Low energy electron induced X-ray emission spectrometry (LEXES) and secondary ion mass spectrometry (SIMS) sensitivity studies to ultra shallow arsenic implants

Low energy electron induced X-ray emission spectrometry (LEXES) is used to monitor dose sensitivity before and after annealing, secondary ion mass spectrometry (SIMS) is used to monitor the dose and profile sensitivity after anneal. AR-XPS was also used to monitor the native oxide thickness before and after annealing, and the oxidation state of arsenic.