کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9817777 1518771 2005 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Tuning for optimal performance in angle control, uniformity, and energy purity
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Tuning for optimal performance in angle control, uniformity, and energy purity
چکیده انگلیسی
Advances in reducing the sizes of device structures and line widths place increasing demands on the accuracy of dopant placement and the control of dopant motion during activation anneals. Serial process high current ion implantation systems seek to produce beams in which the angles are controlled to high precision avoiding the angles introduced by conical structures used for holding wafers on spinning discs in batch systems. However, ion optical corrections and control of incident beam angle, dose uniformity, high throughput and energy purity often present apparently contradictory requirements in machine design. Data is presented to illustrate that tuning procedures can be used to simultaneously optimize angle purity in both x and y planes as well as control energy purity and dose uniformity.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 237, Issues 1–2, August 2005, Pages 365-371
نویسندگان
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