کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9818206 | 1518777 | 2005 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
A progress review of proton beam writing applications in microphotonics
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
The proton beam writing technique is a direct write lithographic technique that is being actively developed at the Centre for Ion Beam Applications, National University of Singapore for microphotonic applications. The technique utilizes a highly focused beam of MeV protons to pattern or modify the refractive index of various materials including polymers, glasses and other inorganic crystals. The technique has been applied to the fabrication of several different types of microoptical components including waveguides, gratings, microlens arrays and colloidal crystal templates. In this paper we give a review of the progress made thus far by our group and other workers in the field of microphotonics using proton beam writing.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 231, Issues 1â4, April 2005, Pages 364-371
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 231, Issues 1â4, April 2005, Pages 364-371
نویسندگان
A.A. Bettiol, T.C. Sum, F.C. Cheong, C.H. Sow, S. Venugopal Rao, J.A. van Kan, E.J. Teo, K. Ansari, F. Watt,