Characterisation of 60° misfit dislocations in SiGe alloy using nuclear microscopy

This paper uses the transmission ion channeling technique on the NUS Singletron accelerator to map misfit dislocations at the interface of a SiGe layer epitaxially grown on a (0 0 1) silicon substrate. A bunch of five 60° dislocations and a single dislocation have been studied using a focused 2 MeV proton beam with a spatial resolution of 60 nm and good image statistics. The bent (1 1 0) planes due to 60° dislocations cause the image contrast to change asymmetrically while tilting the sample close to the channeling direction.