کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9818386 | 1518780 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Inherent surface roughening as a limiting factor in epitaxial cluster deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
Deposition of nanoclusters at thermal energies will result in an onset of roughening of the deposited surface. In order to grow epitaxial films using cluster deposition at soft landing conditions, the effect of this inherent surface roughness on the alignment of deposited clusters must be investigated. Using molecular dynamics computer simulations we have determined the maximum size of Cu clusters that will align epitaxially, upon deposition at thermal energies, on rough (1Â 0Â 0) Cu substrates with temperatures ranging from 0Â K to 750Â K. We have also shown that the likelihood of epitaxial alignment for the resulting structures is dependent on the point of impact of a cluster relative to previously deposited clusters.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 228, Issues 1â4, January 2005, Pages 69-74
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 228, Issues 1â4, January 2005, Pages 69-74
نویسندگان
K. Meinander, K. Nordlund, J. Keinonen,