| کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن | 
|---|---|---|---|---|
| 9821474 | 1518985 | 2005 | 5 صفحه PDF | دانلود رایگان | 
عنوان انگلیسی مقاله ISI
												XPS analysis of pulsed-plasma ion-nitrided Ni- and Ti-aluminides
												
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																																												موضوعات مرتبط
												
													مهندسی و علوم پایه
													مهندسی مواد
													سطوح، پوششها و فیلمها
												
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												چکیده انگلیسی
												The complex nitrides of intermetallics based on titanium, aluminium and nickel are very promising materials for high-performance coatings. Samples of Ni3Al and TiAl3 were prepared by the self-propagating high-temperature synthesis (SHS) of elemental powders in an argon atmosphere with subsequent pulsed-plasma ion nitriding. Results from the combustion synthesis of aluminides of nickel and titanium followed by ion nitriding are presented. X-ray photoelectron spectroscopy (XPS) analysis of the Ni3Al confirmed the formation of a nitride with a binding energy Al 2p 74.6 eV, the formation of AlN was observed for both aluminides; however, the presence of TiN nitride was not confirmed for the TiAl3.
											ناشر
												Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 80, Issues 1â3, 14 October 2005, Pages 35-39
											Journal: Vacuum - Volume 80, Issues 1â3, 14 October 2005, Pages 35-39
نویسندگان
												Matjaž Torkar, Djordje Mandrino, Valery Rosenband,